Journalartikel

Identification of the mechanism in the photoelectrochemical reduction of oxygen on the surface of a molecular semiconductor


AutorenlisteSchlettwein, D; Jaeger, NI

Jahr der Veröffentlichung1993

Seiten3333-3337

ZeitschriftJournal of Physical Chemistry

Bandnummer97

Heftnummer13

ISSN0022-3654

DOI Linkhttps://doi.org/10.1021/j100115a040

VerlagAmerican Chemical Society


Abstract
The rate-limiting step in the photoelectrochemical reduction of oxygen on a molecular semiconductor is found to be the charge transfer at the electrode surface. The electrode consisted of a thin film of phthalocyaninatozinc-(II) in a mixture of poly(vinylidene fluoride) on indium-tin oxide. The current transients as the response upon illumination are analyzed under variation of the light intensity and of the oxygen partial pressure. A model is presented that explains the photoelectrochemical behavior on the basis of oxygen adsorption at the electrode surface according to Langmuir's adsorption isotherm prior to the charge-transfer step. The importance of surface states created by this mechanism for the photoelectrochemical properties of a molecular semiconductor is thereby elucidated.



Autoren/Herausgeber




Zitierstile

Harvard-ZitierstilSchlettwein, D. and Jaeger, N. (1993) Identification of the mechanism in the photoelectrochemical reduction of oxygen on the surface of a molecular semiconductor, Journal of Physical Chemistry, 97(13), pp. 3333-3337. https://doi.org/10.1021/j100115a040

APA-ZitierstilSchlettwein, D., & Jaeger, N. (1993). Identification of the mechanism in the photoelectrochemical reduction of oxygen on the surface of a molecular semiconductor. Journal of Physical Chemistry. 97(13), 3333-3337. https://doi.org/10.1021/j100115a040


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