Journal article

Identification of the mechanism in the photoelectrochemical reduction of oxygen on the surface of a molecular semiconductor


Authors listSchlettwein, D; Jaeger, NI

Publication year1993

Pages3333-3337

JournalJournal of Physical Chemistry

Volume number97

Issue number13

ISSN0022-3654

DOI Linkhttps://doi.org/10.1021/j100115a040

PublisherAmerican Chemical Society


Abstract
The rate-limiting step in the photoelectrochemical reduction of oxygen on a molecular semiconductor is found to be the charge transfer at the electrode surface. The electrode consisted of a thin film of phthalocyaninatozinc-(II) in a mixture of poly(vinylidene fluoride) on indium-tin oxide. The current transients as the response upon illumination are analyzed under variation of the light intensity and of the oxygen partial pressure. A model is presented that explains the photoelectrochemical behavior on the basis of oxygen adsorption at the electrode surface according to Langmuir's adsorption isotherm prior to the charge-transfer step. The importance of surface states created by this mechanism for the photoelectrochemical properties of a molecular semiconductor is thereby elucidated.



Citation Styles

Harvard Citation styleSchlettwein, D. and Jaeger, N. (1993) Identification of the mechanism in the photoelectrochemical reduction of oxygen on the surface of a molecular semiconductor, Journal of Physical Chemistry, 97(13), pp. 3333-3337. https://doi.org/10.1021/j100115a040

APA Citation styleSchlettwein, D., & Jaeger, N. (1993). Identification of the mechanism in the photoelectrochemical reduction of oxygen on the surface of a molecular semiconductor. Journal of Physical Chemistry. 97(13), 3333-3337. https://doi.org/10.1021/j100115a040


Last updated on 2025-25-07 at 13:29